Electric resistance heating devices – Heating devices – Vaporizer
Reexamination Certificate
2006-12-26
2006-12-26
Bueker, Richard (Department: 1763)
Electric resistance heating devices
Heating devices
Vaporizer
C392S400000, C392S403000, C118S726000
Reexamination Certificate
active
07155115
ABSTRACT:
The invention concerns a device and a process for applying a lubricant by means of vapour deposition to a target object, especially a magnetic data carrier. The device in accordance with the invention comprises a lubricant supply means (1) that can be filled from outside, possibly by means of a feed line. The produced lubricant vapour (5) is expanded through one or more exit openings (6) in the direction of a target object (8) on which the vapour deposition is to be effected. The vapour at first becomes adsorbed on the walls of a cone-shaped distribution element (4) situated between the lubricant supply means (1) and the target object (8), from which it subsequently desorbs again. Said adsorption/desorption process assures an even and homogeneous vapour distribution over the target object (8). A device for interrupting the vapour supply makes it possible for the device to be operated in a discontinuous manner.
REFERENCES:
patent: 4125086 (1978-11-01), Vig et al.
patent: 4392453 (1983-07-01), Luscher
patent: 4412508 (1983-11-01), Ney et al.
patent: 4565158 (1986-01-01), Koprio
patent: 4606296 (1986-08-01), Gailliard et al.
patent: 5336324 (1994-08-01), Stall et al.
patent: 5562965 (1996-10-01), Gui et al.
patent: 6011904 (2000-01-01), Mattord
patent: 6099896 (2000-08-01), Stirniman
patent: 6183831 (2001-02-01), Hughes et al.
patent: 6214410 (2001-04-01), Stirniman et al.
patent: 6264751 (2001-07-01), Kamura et al.
patent: 6296894 (2001-10-01), Tanabe et al.
patent: 43 42 574 (1995-04-01), None
patent: 63-310792 (1988-12-01), None
patent: 11-172418 (1999-06-01), None
patent: 2000-087224 (2000-03-01), None
patent: 2000-313952 (2000-11-01), None
Bueker Richard
OC Oerlikon Balzers AG
Sheridan & Ross P.C.
LandOfFree
Method and device for vacuum sputtering does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and device for vacuum sputtering, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and device for vacuum sputtering will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3670157