Method and device for vacuum-coating a substrate

Details Method and device for vacuum-coating a substrate Method and device for vacuum-coating a substrate

2005-03-22

2005-03-22

Turner, Archene (Department: 1775)

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C051S307000, C051S309000, C428S216000, C428S408000, C428S446000, C428S698000, C428S699000

Reexamination Certificate

active

06869676

ABSTRACT:
A method is proposed for vacuum-coating a substrate using a plasma-CVD method. In order to control ion bombardment during the vacuum coating, a substrate voltage, produced independently from a coating plasma, is applied to the substrate. The substrate voltage is modified during the coating. The substrate voltage is a direct voltage that is pulsed in bipolar fashion with a frequency of 0.1 kHz to 10 MHz. A wear-resistant and friction-reducing multilayer structure of alternating hard material individual layers and carbon or silicon individual layers is proposed.

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