Method and device for vacuum-coating a substrate

Details Method and device for vacuum-coating a substrate Method and device for vacuum-coating a substrate

2011-05-17

2011-05-17

Kackar, Ram N. (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C118S7230MW, C204S192100, C204S298010

Reexamination Certificate

active

07942111

ABSTRACT:
A method is proposed for vacuum-coating a substrate using a plasma-CVD method. In order to control ion bombardment during the vacuum coating, a substrate voltage, produced independently from a coating plasma, is applied to the substrate. The substrate voltage is modified during the coating. The substrate voltage is a direct voltage that is pulsed in bipolar fashion with a frequency of 0.1 kHz to 10 MHz. A wear-resistant and friction-reducing multilayer structure of alternating hard material individual layers and carbon or silicon individual layers is proposed.

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