Electrolysis: processes – compositions used therein – and methods – Electrolytic material treatment – Water – sewage – or other waste water
Patent
1996-12-18
1998-06-16
Phasge, Arun S.
Electrolysis: processes, compositions used therein, and methods
Electrolytic material treatment
Water, sewage, or other waste water
204164, 204165, 204176, 42218607, 42218616, 422907, C01B 1311, C02F 146
Patent
active
057664471
ABSTRACT:
The invention relates to a method and a device for treating an aqueous solution, in which a pulsed electric field is generated in the aqueous solution between two electrodes. In accordance with the invention, at least one of the electrodes is covered with a layer of a dielectric material which, during operation of the device, completely separates this (these) electrode(s) from the aqueous solution. This measure in accordance with the invention enables field strengths to be used which are much higher than those permissible in the known devices. The use of an oxygen-containing gas and a bipolarly pulsed electric field leads to a further improvement of the method in accordance with the invention.
REFERENCES:
patent: 4051043 (1977-09-01), Harter et al.
patent: 5464513 (1995-11-01), Goriachev et al.
patent: 5478533 (1995-12-01), Inculet
patent: 5549795 (1996-08-01), Gregoire et al.
patent: 5630915 (1997-05-01), Greene et al.
A.K. Sharma et al, "A Preliminary Study of Pulsed Streamer Corona Discharge for the Degradation of Phenol in Aqueous Solutions", Hazardous Waste & Hazardous Materials 10 (2), 1993, pp. 209-219.
Barschall Anne E.
Phasge Arun S,.
U.S. Philips Corporation
LandOfFree
Method and device for treating an aqueous solution does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and device for treating an aqueous solution, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and device for treating an aqueous solution will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1721047