Method and device for the uniformly even application of a resin

Coating processes – Centrifugal force utilized

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118 52, 437231, 427336, 427377, B05D 312, B05C 1102

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active

050135864

ABSTRACT:
Method and device for the uniformly even application of a resin coating on a substrate, wherein it comprises a rotary plate (1) receiving the substrate (3) and provided with means for rendering the substrate stationary on the plate so that rotation of the plate (1) provokes the spreading of a thin coating of the resin over the surface of the substrate. A concentric cover (3) is superimposed on the circular plate (1) and provokes the rotation of this cover along with the plate by confining the gaseous volume constituted by a suspended solvent preserving the properties of the dissolved resin during the spreading cycle constituting the internal atmosphere in which the substrate is placed, this volume being driven in rotation approximately synchronous with the plate and the cover.

REFERENCES:
patent: 2632725 (1953-03-01), Marks et al.
patent: 4068019 (1978-01-01), Boeckl
patent: 4075974 (1978-02-01), Plows
patent: 4086870 (1978-05-01), Canavello et al.
patent: 4587139 (1986-05-01), Hagan
Apparatus for Preventing Rebounding of Spinner, Patent Abstract of Japan, vol. 11, No. 259, Aug. 21, 1987.
Spinner, Patent Abstract of Japan, vol. 9, No. 230, Sep. 17, 1985.
Coating Device, Patent Abstracts of Japan, vol. 9, No. 318, Dec. 13, 1985.
"Controlled Gap Photoresist Spinning Process" in IBM Tech. Disclosure Bulletin, vol. 17, No. 11, Apr. 1975.

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