Method and device for the production of a semiconducting...

Details Method and device for the production of a semiconducting... Method and device for the production of a semiconducting...

2006-08-08

2006-08-08

Ngô, Ngân V. (Department: 2818)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

C438S099000, C438S781000, C257S040000, C257S642000

Reexamination Certificate

active

07087453

ABSTRACT:
Method of manufacturing a semiconducting organic laminated structure, for use in an electronic circuit, in particular a logic and/or memory circuit, wherein a substrate is coated with a solution or dispersion containing a small proportion of an organic composite and having a certain wet-layer thickness, which by drying is converted into an organic thin layer with semiconducting properties that adheres to the substrate and has a dry-layer thickness substantially less than the wet-layer thickness, in particular by an order of magnitude or more, the drying being accomplished by brief irradiation with electromagnetic radiation that has its main effective component in the near-infrared range, in particular in the region between 0.8 and 1.5 μm.

REFERENCES:
patent: 4761361 (1988-08-01), Ozaki et al.
patent: 4913949 (1990-04-01), Steininger et al.
patent: 5154808 (1992-10-01), Miyasaka et al.
patent: 5709974 (1998-01-01), Yuh et al.
patent: 5727578 (1998-03-01), Matthews
patent: 5895692 (1999-04-01), Shirasaki et al.
patent: 6060826 (2000-05-01), Ueda et al.
patent: 6103436 (2000-08-01), Yanus et al.
patent: 6132913 (2000-10-01), Fuller et al.
patent: 198 51 703 (2000-05-01), None
patent: 0 132 248 (1985-01-01), None
patent: 0 652 243 (1995-05-01), None
patent: 0 930 641 (1999-07-01), None
patent: 06-053132 (1994-02-01), None
patent: 99/19900 (1999-04-01), None
patent: 99/39373 (1999-08-01), None
U. Kilian/Chr. Weber (Editor): “Lexicon of Physics in 6 Volumes”, vol. 3, 1999, Spektrum Akademischer Verlag (publishers), Heidelberg, p. 127f.—Infrarot.
“Brockhaus Encyclopedia”, 19thedition, vol. 10, 1989, F. A. Brockhaus GmbH Mannheim; p. 499-501—Infrared—Infrared dryer.
Kupfer, “Trockenschrankverfahren, Infrarot —Und mikrowellentrocknung Als Referenzverfahren Zur Bestimmung Der Materialfeuchte Drying Oven Method, Infared —And Microwave Drying As Reference Methods for Determination of Material Moisture”, Technisches Messen TM, vol. 66(6):227-237, (1999).
Patent Abstracts of Japan, Nakazawa, “Drying Method for Organic Photosensitive Body”, vol. 011, No. 137, (P-572), Aug. 12, 1986, JP 61 277958.
Scott, et al., “Degradation and Failure of MEH-PPV Light-Emitting Diodes”, Journal of Applied Physics, American Institute of Physics, vol. 79(5):2745-2751, (1996).
Anon, “Infarot (IR) Und Ihre Industrielle Anwendung”, Kautschuk und Gummi —Kunststoffe, vol. 36(10):899-901, (1983).
Yamashita et al., “Encapsulation of Organic Light-Emitting Diode Using Thermal Chemical-Vapour-Deposition Polymer Film”, Journal of Physics D (Applied Physics), vol. 34(5):740-743, (2001).

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