Semiconductor device manufacturing: process – Semiconductor substrate dicing
Reexamination Certificate
2005-09-20
2005-09-20
Lebentritt, Michael (Department: 2829)
Semiconductor device manufacturing: process
Semiconductor substrate dicing
C438S110000, C438S462000, C438S464000
Reexamination Certificate
active
06946366
ABSTRACT:
A wafer cap protects micro electromechanical system (“MEMS”) structures during a dicing of a MEMS wafer to produce individual MEMS dies. A MEMS wafer is prepared having a plurality of MEMS structure sites thereon. Upon the MEMS wafer, the wafer cap is mounted to produce a laminated MEMS wafer. The wafer cap is recessed in areas corresponding to locations of the MEMS structure sites on the MEMS wafer. The capped MEMS wafer can be diced into a plurality of MEMS dies without causing damage to or contaminating the MEMS die.
REFERENCES:
patent: 4791075 (1988-12-01), Lin
patent: 4907065 (1990-03-01), Sahakian
patent: 5150196 (1992-09-01), Yamamoto et al.
patent: 5323051 (1994-06-01), Adams et al.
patent: 5362681 (1994-11-01), Roberts, Jr. et al.
patent: 5435876 (1995-07-01), Alfaro et al.
patent: 5610431 (1997-03-01), Martin
patent: 5641714 (1997-06-01), Yamanaka
patent: 5824177 (1998-10-01), Yoshihara et al.
patent: 5831162 (1998-11-01), Sparks et al.
patent: 5888883 (1999-03-01), Sasaki et al.
patent: 6106735 (2000-08-01), Kurle et al.
patent: 6109113 (2000-08-01), Chavan et al.
patent: 6210514 (2001-04-01), Cheung et al.
patent: 6410360 (2002-06-01), Steenberge
patent: 6426275 (2002-07-01), Arisa
patent: 6429506 (2002-08-01), Fujii et al.
patent: 6555417 (2003-04-01), Spooner et al.
patent: 199 11 916 (1999-09-01), None
patent: 100 13 067 (2000-09-01), None
patent: 08250454 (1996-09-01), None
US 6,303,409, 10/2001, Karpman et al. (withdrawn)
Spooner et al., U.S. Appl. No. 10/007,585, filed on Dec. 5, 2001. See claim set.
Courage David S.
Spooner Timothy R.
Workman Brad
Analog Devices Inc.
Gauthier & Connors
Geyer Scott B.
Lebentritt Michael
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