Method and device for preparing implant surfaces

Details Method and device for preparing implant surfaces Method and device for preparing implant surfaces

1996-05-09

1997-12-16

Griffin, Steven P.

Glass manufacturing

Processes

Operating under inert or reducing conditions

65157, 422 23, 4332011, 623901, C03B 3200, A61L 214, A61C 800

Patent

active

056979975

ABSTRACT:
A method for preparing implant surfaces using gas discharge plasma including conveying the implants to a vacuum chamber. The implants are treated with an inert gas plasma to remove existing surface contamination and oxide layers from the implant surfaces. The implants are treated with an oxidizing plasma or by means of thermal oxidation to reoxidizing the implant surfaces. The implant treatment steps are carried out in a closed space, including a controlled atmosphere and produce a highly accurate and reproducible microstructure, composition, purity, and sterility in the implants.

REFERENCES:
patent: 3948601 (1976-04-01), Fraser et al.
patent: 4330891 (1982-05-01), Branemark et al.
patent: 4959199 (1990-09-01), Brewer
patent: 5071351 (1991-12-01), Green, Jr. et al.
patent: 5173273 (1992-12-01), Brewer
patent: 5188800 (1993-02-01), Green, Jr. et al.
patent: 5376332 (1994-12-01), Martens et al.
Patent Abstracts of Japan vol. 15, No. 126 (C-0817) 27 Mar. 1991 and JP-A-03 010 061 (Nissin Electric Co Ltd) 17 Jan. 1991 *Abstract*.
Biomaterial and implant surfaces: On the Role of Cleanliness, Contamination, and Preparation Procedures, Kasemo et al., J. Biomed. Mater. Res.: Applied Biomaterials, vol. 22, No. A2, 145-158 (1988).

Affiliated with

Also associated with

Rating

Method and device for preparing implant surfaces does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and device for preparing implant surfaces, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and device for preparing implant surfaces will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-201887