Gas and liquid contact apparatus – Contact devices – Liquid tank
Patent
1998-06-24
2000-07-11
Bushey, C. Scott
Gas and liquid contact apparatus
Contact devices
Liquid tank
96202, 96244, 210750, B01F 304
Patent
active
06086057&
ABSTRACT:
A cleaning solution preparation device includes a deionized water supply source, a gas supply source, a gas-dissolving unit, and a gas supply pressure controller. The gas supply source supplies any of an oxidative gas, a reductive gas, an inert gas, a mixed gas of an oxidative gas and an inert gas, or a mixed gas of a reductive gas and an inert gas. The gas-dissolving unit dissolves the gas supplied from the gas supply source in deionized water supplied from the deionized water supply source to supply a gas-dissolved cleaning solution to objects to be cleaned. The gas supply pressure controller controls the pressure of the supplied gas at a value exceeding the atmospheric pressure when dissolving the gas in the deionized water.
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Imaoka Takashi
Kasama Yasuhiko
Mitsumori Ken'ichi
Oh Eui-Yeol
Ohmi Tadahiro
Bushey C. Scott
Tadahiro Ohmi and Organo Corporation
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