Method and device for outside plasma deposition of hydroxyl ion-

Details Method and device for outside plasma deposition of hydroxyl ion- Method and device for outside plasma deposition of hydroxyl ion-

1990-06-05

1993-03-16

Paschall, Mark H.

Electric heating

Metal heating

By arc

21912147, 21912143, 427446, 55267, 65 312, B23K 900

Patent

active

051947145

ABSTRACT:
Method of outside plasma deposition onto a rod (17,22) of silica substantially free from hydroxyl ions, possibly doped to change its refractive index, by reaction with oxygen of a silicon compound and possibly of doping compounds, in the presence of a gas plasma raised to a very high temperature (16) by induction with the help of a high frequency generator (15). The rod on which the silica deposit is made is kept in a sealed chamber (19) separated from the surrounding atmosphere and supplied by a pipe (20) with atmospheric air that is successively passed through a filter (31), a compressor (32) a cooling means (33), a condensation water drain (35) and a final desiccation by adsorption (36, 38). A device for implementing the method is also claimed.

REFERENCES:
patent: 4162908 (1979-07-01), Rau et al.
patent: 4441788 (1984-04-01), Guerder et al.
patent: 4583997 (1986-04-01), Staudigl
patent: 4740226 (1988-04-01), Toda
patent: 4793832 (1988-12-01), Veltman et al.
patent: 4881953 (1989-11-01), Prasad et al.
patent: 4957516 (1990-09-01), Daniels

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