Method and device for monitoring a heat treatment of a...

Details Method and device for monitoring a heat treatment of a... Method and device for monitoring a heat treatment of a...

2007-06-11

2010-12-07

Geyer, Scott B (Department: 2812)

Semiconductor device manufacturing: process

With measuring or testing

Reexamination Certificate

active

07846749

ABSTRACT:
A method of monitoring a heat treatment of a microtechnological substrate includes placement of the substrate to be treated in a heating zone and applying a heat treatment to the substrate, under predetermined temperature conditions, while monitoring the change over the course of time in the vibratory state of the substrate, and detecting a fracture in the substrate by detecting a peak characteristic in the vibratory state over the course of time.

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Machine Translation of JP 2004-179566.
International Search Report, Mar. 6, 2008.
French Written Opinion, Mar. 6, 2008.

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