Etching a substrate: processes – Nongaseous phase etching of substrate – Etching using radiation
Reexamination Certificate
2005-03-01
2005-03-01
Vinh, Lan (Department: 1765)
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching using radiation
C216S062000, C216S065000, C216S066000
Reexamination Certificate
active
06861008
ABSTRACT:
For the laser drilling of organic materials, in particular for making blind holes in dielectric layers, a frequency-doubled Nd-vanadate laser with the following parameters is used:pulse width<40nspulse frequency≧20kHzwavelength=532nm.
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De Steur Hubert
Heerman Marcel
Puymbroeck Jozef Van
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