Method and device for inspecting micromask patterns

Details Method and device for inspecting micromask patterns Method and device for inspecting micromask patterns

1981-12-08

1984-08-14

Adams, Russell E.

Boots, shoes, and leggings

364491, B41B 4100

Patent

active

044653506

ABSTRACT:
Inspection of micromask patterns occurs by both moving an inspecting laser beam relative to a micromask and varying the intensity of said beam in the same manner that occurs during pattern generation. The pattern modulates the inspecting laser beam by one of reflecting or transmitting a modulated laser beam therefrom. The modulated beam then is sensed and used to produce a modulation signal. The modulated signal is compared to a control signal, which controls both the relative movement between a writing laser beam and the micromask and varies the beam intensity during pattern generation. Agreement between the modulation and control signals indicates correct pattern generation and a difference therebetween indicates a pattern inaccuracy.

REFERENCES:
patent: 3670153 (1972-06-01), Rempert et al.
patent: 3844461 (1974-10-01), Robison et al.
patent: 3881098 (1975-04-01), Rich
patent: 3903527 (1975-09-01), Frehling
patent: 3985439 (1976-10-01), Kiemle
patent: 4060816 (1977-11-01), Westerberg
patent: 4231659 (1980-11-01), Logan
patent: 4295198 (1981-10-01), Copeland et al.
patent: 4305097 (1981-12-01), Doemens et al.

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