Method and device for in situ quantification, by reflectometry,

Details Method and device for in situ quantification, by reflectometry, Method and device for in situ quantification, by reflectometry,

1996-07-31

1998-05-05

Evans, F. L.

Optics: measuring and testing

With plural diverse test or art

356328, G01J 342

Patent

active

057482969

ABSTRACT:
An illumination beam is sent onto a localized region of the surface layer of a thin-film structure which is being etched in a vacuum processing chamber. The reflective light beam is sent through a filter to the matrix sensor of a video camera, and to an optical disperser or an interference filter, a selection diaphragm, a fiber-optic cable, and an analysis slit at the input of the optical disperser or interference filter. A spectral analysis of the reflective light beam is performed to detect, by reflectometry, the transition of the following layer in a specific analysis region of the localized region.

REFERENCES:
patent: 4988198 (1991-01-01), Kondo
patent: 5355217 (1994-10-01), Canteloup et al.

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