Method and device for immersion lithography

Details Method and device for immersion lithography Method and device for immersion lithography

2008-05-06

2008-05-06

Huff, Mark F. (Department: 1756)

Photocopying

Projection printing and copying cameras

Methods

C355S018000, C355S053000, C430S322000

Reexamination Certificate

active

10679701

ABSTRACT:
The present invention relates to an immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation. Said system comprising a source emitting electromagnetic radiation onto an object plane, a mask, adapted to receive and modulate said electromagnetic radiation at said object plane and to relay said electromagnetic radiation toward said work piece, and an immersion medium contacting at least a portion of a final lens of said lithographic system and a portion of said work piece, wherein an area of said contacting is restricted by capillary forces. The invention further relates to a method for patterning a workpiece.

REFERENCES:
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 5900354 (1999-05-01), Batchelder
patent: 6230722 (2001-05-01), Mitsumori et al.
patent: 6952253 (2005-10-01), Lof et al.
patent: 6954256 (2005-10-01), Flagello et al.
patent: 2003/0030916 (2003-02-01), Suenaga
patent: 2003/0123040 (2003-07-01), Almogy
patent: 2004/0075895 (2004-04-01), Lin
patent: 2006/0023182 (2006-02-01), Novak et al.
patent: 1498778 (2005-01-01), None
patent: 10255319 (1998-09-01), None
patent: WO 9949504 (1999-09-01), None
PCT International Search Report re: International Application No. PCT/SE2004/001403 (filed Oct. 1, 2004) mailed Mar. 8, 2005 (not prior art).
PCT International Preliminary Report on Patentability for Application No. PCT/SE2004/001403, completed Jan. 17, 2006.

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