Method and device for image measurement, exposure apparatus,...

Details Method and device for image measurement, exposure apparatus,... Method and device for image measurement, exposure apparatus,...

2011-08-30

2011-08-30

Glick, Edward J (Department: 2882)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S072000

Reexamination Certificate

active

08009272

ABSTRACT:
An image measurement method is provided for measuring an image of a pattern of a mask projected with a projection optical system. The method includes the steps of detecting light transmitted through an aperture while a substrate is arranged at an image plane of the projection optical system, the substrate having a slit and the aperture having a width larger than a width of the slit; adjusting an alignment angle of the slit on the basis of a signal related to the light detected in the detecting; and measuring the image by detecting light transmitted through the slit while moving the slit, the alignment angle of which has been adjusted in the adjusting, in the image plane of the projection optical system.

REFERENCES:
patent: 6151102 (2000-11-01), Nishi
patent: 2006/0132775 (2006-06-01), Sengers et al.
patent: 2007/0153251 (2007-07-01), Ogusu
W. N. Partlo, C. H. Fields and W. G. Oldham, “Direct aerial image measurement as a method of testing high numerical aperture microlihographic lenses”, J. Vac. Sci. Technol. B, vol. 11, pp. 2686-2691.

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