Coating apparatus – Gas or vapor deposition – With treating means
Patent
1986-04-18
1987-12-22
Kittle, John E.
Coating apparatus
Gas or vapor deposition
With treating means
118 501, 118715, 118726, 4272551, C23C 1408, C23C 1426
Patent
active
047140470
ABSTRACT:
A method for forming an ultrafine particle film of compound includes the steps of evacuating a vessel provided with an evaporation source in its bottom portion, by which a material to be evaporated is retained, and a base plate in its upper portion, on which ultrafine particles of compound are to be deposited, supplying a reactive gas into the evacuated vessel, evaporating the retained material by heating the evaporation source and making the material interact with the reactive gas to form ultrafine particles of compound and depositing the formed ultrafine particles of compound on the base plate. The reactive gas is directly supplied to an interaction area adjacent to the evaporation source, in which the evaporated material concentrically exists. And a device for forming a ultrafine particle film of compound has a vessel for forming a reactive gas atmosphere, an evaporation source for retaining and heating a material to be evaporated, which is provided in the bottom portion within the vessel, a base plate on which ultrafine particles of compound are to be deposited and which is provided in the upper portion within the vessel so as to be opposed to the evaporation source in the vertical direction, and a gas introducing pipe for supplying a reactive gas into the vessel, which has a gas injection port positioned in an interaction area adjacent to the evaporation source.
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Hattori Tadashi
Ikeda Hirotane
Mukainakano Shinichi
Ohta Minoru
Bashore Alain
Kittle John E.
Nippon Soken Inc.
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