Method and device for forming a layer by plasma-chemical process

Details Method and device for forming a layer by plasma-chemical process Method and device for forming a layer by plasma-chemical process

1988-12-08

1990-04-10

Morgenstern, Norman

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

118723, 118 501, B05D 306, C23C 1400, C23C 1600

Patent

active

049159780

ABSTRACT:
A method and a device are proposed for formation of a layer on a surface of a substrate by plasma-chemical process, where the surface is aligned parallel to the electrical field required for the plasma-chemical process. In addition, the gas required therefor flows directly onto the surface.

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