Method and device for determining the contour of spin-coated thi

Details Method and device for determining the contour of spin-coated thi Method and device for determining the contour of spin-coated thi

1984-10-29

1986-07-15

Morgenstern, Norman

Coating processes

Measuring, testing, or indicating

Thickness or uniformity of thickness determined

427 82, 427240, 427282, 427286, 428409, 428457, 428688, 428901, B05D 312

Patent

active

046005978

ABSTRACT:
A method for determining the contour of a spin-coated thin film of material, such as a photoresist solution, on an uneven topography, such as a patterned semiconductor wafer, utilizes a pattern of features as isolated, raised lines of different widths. The pattern serves to provide frequency weighted parameters used to estimate the coating conformality on both simple and complex topographies. One parameter indicating the contour is independent of coating thickness and the other parameter suggests the range of feature-to-feature interaction inherent in complex topographies. The pattern is useful as a "knock-out" portion of a product wafer to monitor the contour of the coating deposited by spun-coated process steps.
Orienting the line pattern in radial and tangential position reveals coating thickness relationships dependent on feature orientation with respect to the centrifugal center of the substrate.

REFERENCES:
patent: 4515828 (1985-05-01), Economy
The American Heritage Dictionary, Houghton Mifflin Co., Boston, 1976, p. 1262.
D. W. Widmann & H. Binder, "Linewidth Variations in Photoresist Patterns on Profiled Surfaces," IEEE Trans. Electron Devices, vol. ED-22, No. 7, pp. 467-471 (Jul. 1975).
M. M. O'Toole, E. D. Liu & M. S. Chang, "Linewidth Control in Projection Lithography Using a Multilayer Resist Process," IEEE Trans. Electron Devices, vol. ED-28, No. 11, pp. 1405-1410 (Nov. 1981).
A. C. Adams & C. D. Capio, "Planarization of Phosphorus-Doped Silicon Dioxide," J. Electrochem. Soc., vol. 128, No. 2, pp. 423-429 (1981).
R. C. Singleton, "An Algorithm for Computing the Mixed Radix Fast Fourier Transform," IEEE Trans. Audio and Electroacoustics, vol. AU-17, No. 2, pp. 93-100 (Jun. 1969).

Affiliated with

Also associated with

Rating

Method and device for determining the contour of spin-coated thi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and device for determining the contour of spin-coated thi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and device for determining the contour of spin-coated thi will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1740507