Power plants – Internal combustion engine with treatment or handling of... – By means producing a chemical reaction of a component of the...
Reexamination Certificate
2006-03-28
2006-03-28
Denion, Thomas (Department: 3748)
Power plants
Internal combustion engine with treatment or handling of...
By means producing a chemical reaction of a component of the...
C060S274000, C060S297000, C060S311000
Reexamination Certificate
active
07017337
ABSTRACT:
A method and a device for controlling an exhaust gas aftertreatment system, in which a first state variable characterizes the state of the exhaust gas aftertreatment system. A second state variable takes into consideration additional influences on the special operating state. A special operating state is initiated as a function of the first and the second state variable.
REFERENCES:
patent: 4452040 (1984-06-01), Kobashi
patent: 4597262 (1986-07-01), Retallick
patent: 4630438 (1986-12-01), Shinzawa
patent: 4685290 (1987-08-01), Kamiya et al.
patent: 4881369 (1989-11-01), Kanesaki
patent: 5941066 (1999-08-01), Araki et al.
patent: 6237326 (2001-05-01), Russell
patent: 6397587 (2002-06-01), van Nieuwstadt et al.
patent: 6422001 (2002-07-01), Sherman et al.
patent: 6557340 (2003-05-01), Twigg et al.
patent: 197 46 855 (1999-04-01), None
patent: 199 06 287 (2000-08-01), None
patent: 0 867 604 (1998-09-01), None
patent: 0 943 786 (1999-09-01), None
patent: 2 774 421 (1999-08-01), None
patent: WO 99 35386 (1999-07-01), None
patent: WO 01 61162 (2001-08-01), None
Harndorf Horst
Plote Holger
Schernewski Ralf
Walter Michael
Denion Thomas
Robert & Bosch GmbH
Tran Diem
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