Method and device for adjusting an alignment microscope by...

Photocopying – Projection printing and copying cameras – Focus or magnification control

Reexamination Certificate

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Details

C355S053000, C356S399000, C250S548000

Reexamination Certificate

active

07057707

ABSTRACT:
The present invention provides for a method for adjusting an alignment microscope. In the method of the present invention an alignment mask is used in which the one side comprises at least one alignment mark and the other side is reflective. For the adjustment, the microscope is first focused to the alignment mark and then refocused to the mirror image of the alignment mark generated by the reflective side. The microscope is then adjusted by comparing the positions of the alignment mark and the generated mirror image of the alignment mark until the alignment mark overlaps its mirror image. Moreover, a device for adjusting an alignment microscope in accordance with the method of the present invention.

REFERENCES:
patent: 5500736 (1996-03-01), Koitabashi et al.
patent: 5739899 (1998-04-01), Nishi et al.
patent: 6340821 (2002-01-01), Brown
patent: 2003/0211409 (2003-11-01), Nunes
patent: 2005/0117140 (2005-06-01), Mishima
patent: 42 42 632 (1994-05-01), None
patent: 100 18 810 (2001-10-01), None
Y. Tanaka, R. Matsuda, K. Shinoyamaa, J. Homma; The Latest Alignment Technology in PCB Step-and-Repeat Projection Exposure System; Apr. 2001; IPC Printed Circuits Expo, 2001; pp. S18-2-1 to S18-2-7.

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