Method and composition for skin treatment

Drug – bio-affecting and body treating compositions – Designated organic active ingredient containing – Peroxide doai

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Details

514859, 514846, A61K 3119, A61K 3340

Patent

active

059589841

ABSTRACT:
Compositions and processes for medicating human skin disorders using hydrogen peroxide as an active antimicrobial agent. The composition includes essentially hydrogen peroxide, a non-volatile carrier-solvent, and water. A predetermined final hydrogen peroxide concentration is achieved through evaporation of water. In this manner, hydrogen peroxide concentration may be controlled to avoid deleterious effects. Other therapeutic agents such as alpha hydroxy acids may also be added to the composition for treating various skin ailments.

REFERENCES:
patent: 825883 (1906-07-01), Heinrici
patent: 959605 (1910-05-01), Queisser
patent: 1002854 (1911-09-01), Liebknecht
patent: 1058070 (1913-04-01), Liebknecht
patent: 1139774 (1915-05-01), Knox
patent: 3954974 (1976-05-01), Herzog et al.
patent: 4363815 (1982-12-01), Yu et al.
patent: 4431631 (1984-02-01), Clipper et al.
patent: 4438102 (1984-03-01), Ganci
patent: 4812173 (1989-03-01), Tsao et al.
patent: 4826681 (1989-05-01), Jaquet et al.
patent: 5336432 (1994-08-01), Petchul et al.
patent: 5380764 (1995-01-01), Herzog
patent: 5393526 (1995-02-01), Castro
patent: 5736582 (1998-04-01), Devillez
patent: 5843998 (1998-12-01), Song et al.

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