Radiant energy – Radiant energy generation and sources – With radiation modifying member
Reexamination Certificate
2008-04-29
2008-04-29
Nguyen, Kiet T. (Department: 2881)
Radiant energy
Radiant energy generation and sources
With radiation modifying member
C250S505100
Reexamination Certificate
active
07365350
ABSTRACT:
The invention is directed to a method and arrangements for the suppression of debris in short-wavelength radiation sources based on a plasma, particularly for EUV sources for semiconductor lithography. The object of the invention is to find a novel possibility for suppressing the particle flow (debris) from a plasma which keeps the debris away from primarily optical components located downstream without excessive attenuation of the desired radiation emitted from the plasma. According to the invention, this object is met in that a buffer gas is injected inside the filter structure of the debris filter lateral to openings that are provided for passing the radiation. The filter structure generates a flow resistance in direction of the plasma and in direction of propagation of the radiation so that an increased gas pressure of buffer gas remains limited to a defined volume layer in the debris filter relative to the pressure in the vacuum chamber, and the buffer gas exiting from the filter structure of the debris filter is sucked out of the vacuum chamber by vacuum pumps.
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Brudermann Jesko
De Bruijn René
Kleinschmidt Juergen
Mader Bjoern
Tran Duc Chinh
Nguyen Kiet T.
Reed Smith LLP
XTREME technologies GmbH
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