Method and arrangement for repairing photolithography masks

Details Method and arrangement for repairing photolithography masks Method and arrangement for repairing photolithography masks

2011-03-29

2011-03-29

Carter, Aaron W (Department: 2624)

Image analysis

Applications

Manufacturing or product inspection

C430S005000

Reexamination Certificate

active

07916930

ABSTRACT:
A method and apparatus for the repair of photolithography masks, wherein a photolithography mask is examined for the presence of defects and a list of the defects is generated, in which at least one type of defect, its extent, and its location on the photolithography mask is assigned to each defect, and these defects are repaired.

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