Method and application of metrology and process diagnostic...

Details Method and application of metrology and process diagnostic... Method and application of metrology and process diagnostic...

2005-03-15

2005-03-15

Picard, Leo (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S109000, C438S014000, C716S030000

Reexamination Certificate

active

06868301

ABSTRACT:
A method for operation of an exposure tool in the fabrication of an integrated circuit to control registration between a preceding layer of and a succeeding layer. The preceding layer having a first alignment mark and a first registration mark. The succeeding layer is aligned to the preceding layer using an exposure tool. The succeeding layer has a second alignment mark and a second registration mark. The exposure tool measures alignment of the first alignment mark relative to the second alignment mark. After additional process steps are performed, a measurement tool measures registration relating to relative positions of the first registration mark and the second registration mark. Both the alignment information from the exposure tool and the registration information from the measurement tool is analyzed to determine corrections to improve registration between the layers, and the operation of the exposure tool is altered to improve registration.

REFERENCES:
patent: 6708075 (2004-03-01), Sonderman et al.
patent: 6756243 (2004-06-01), Pasadyn et al.
patent: 6788988 (2004-09-01), Pasadyn et al.
Levinson et al. “Minimization of Total Overlay Errors on Product Wafers Using an Advanced Optimization Scheme” SPIE vol. 3051, published 1997, pp. 362-373.

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