Method and appertaining pair of mask patterns for fabricating, w

Details Method and appertaining pair of mask patterns for fabricating, w Method and appertaining pair of mask patterns for fabricating, w

1995-02-14

1996-06-18

Lee, John D.

Optical waveguides

Integrated optical circuit

1566291, 385 45, 385130, G02B 6125

Patent

active

055287085

ABSTRACT:
An alignment-tolerant fabrication of a waveguide structure having a symmetrical component structure and an asymmetrical component structure such as an asymmetrical X junction, with the aid of the technique of double masking is presented. The entire waveguide structure is defined by two different mask patterns (p.sub.1, p.sub.2) which are applied successively and in a mutually overlapping position. The two mask patterns are aligned with respect to one another according to alignment directions parallel (z-axis) and perpendicular (x-axis) to the axis of symmetry of the symmetrical component structure. Each mask pattern comprises a first asymmetrical component pattern (32;35) and a second asymmetrical component pattern (31,33; 34,36). The first component patterns (32 and 35) each define a separate portion of the asymmetrical component structure. The second component patterns ((31,33) and (34,36)) are mirror images of one another and comprise component shapes (33;36) which depend on a predefined alignment accuracy (w.sub.1) in the alignment direction perpendicular (x-axis) to the axis of symmetry.

REFERENCES:
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Y. Shani et al; "Buried Rib Passive Waveguide Y Junctions with Sharp Vertex on InP"; Mar. 1991; pp. 210-212; IEEE Photonics Technology Letters; vol. 3, No. 3.
D. A. Smith et al; "A Mode-Evolution-Type Integrated-Optical Beam combiner for Coherent Receivers"; Apr. 1991; pp. 339-341; IEEE Photonics Technology Letters; vol. 3, No. 4.

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