Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate
2006-06-13
2006-06-13
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
By light interference
For dimensional measurement
C356S497000
Reexamination Certificate
active
07061625
ABSTRACT:
In one embodiment, the present invention provides an interferometric inspection system for inspecting semiconductor samples. The system includes at least one illumination source for generating an illumination beam and an interferometric microscope module for splitting the illumination beam into a test beam directed to the semiconductor sample and a reference beam directed to a tilted reference mirror. The beams are combined to generate an interference image at an image sensor. The tilted reference mirror is tilted at a non-normal angle with respect to the reference beam that is incident on the mirror to thereby generate fringes in the interference image. The system also includes an image sensor for acquiring the interference image from the interferometric microscope module and generates an inherence signal. The system further includes a processing module configured to generate complex field information corresponding to the sample from the interference image signal and an alignment module located in the optical path between the interferometric module and the image sensor. In another embodiment, the processing module is configured to generate complex field information from either spatial fringe analysis or temporal fringe analysis performed on the interference image signal.
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U.S. Appl. No. 10/673,058, filed Sep. 26, 2003, Office Action mailed Oct. 19, 2005.
Fu Tao-Yi
Hwang Shiow-Hwei
Beyer Weaver & Thomas LLP
Connolly Patrick
KLA-Tencor Technologies Corporation
Toatley , Jr. Gregory J.
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