Method and apparatus to measure vapor pressure in a flow system

Measuring and testing – Liquid analysis or analysis of the suspension of solids in a... – Vapor pressure

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20415721, G01N 700

Patent

active

050563599

ABSTRACT:
The present invention is directed to a method for determining, by a condensation method, the vapor pressure of a material with a known vapor pressure versus temperature characteristic, in a flow system particularly in a mercury isotope enrichment process.

REFERENCES:
patent: 3379252 (1983-04-01), Work
patent: 3897331 (1975-07-01), Smith
patent: 3983019 (1976-09-01), Botter nee Bergheaud
patent: 4514363 (1985-04-01), Durbin
patent: 4527086 (1985-07-01), Maya
patent: 4648951 (1987-03-01), Maya
patent: 4678550 (1987-07-01), Grossman et al.
patent: 4713547 (1987-12-01), Grossman
Webster and Zare, J. Phys. Chem., 85:1302 (1981).
McDowell et al., Can. J. Chem., 37: 1432 (1959).
Gunning and Swartz, Adv. Photochem., 1:209 (1963).
Weymouth, Electric Discharge Lamps, MIT Press 1971.
Grossman et al., U.S. Ser. No. 815,150, filed Dec. 31, 1985.
Maya et al., Science, 226:435-436, (1984).
R. E. Trebal, "Mass-Transfer Operations" McGraw-Hill Book Company.
F. Gucker, Jr. and R. H. Munch, J. Amer. Chem. soc., 59:1275 (1937).
Nesmeyanov, Vapor Pressure of the Elements, Academic Press, New York (1963).

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