Gas and liquid contact apparatus – Fluid distribution – Systems
Reexamination Certificate
2007-11-27
2007-11-27
Bushey, Scott (Department: 1724)
Gas and liquid contact apparatus
Fluid distribution
Systems
C261S142000, C261S147000, C261SDIG065, C034S380000, C034S497000, C034S510000, C118S726000
Reexamination Certificate
active
10858509
ABSTRACT:
Structure helps support material in a container with an increased exposed surface area to help promote contact of a gas with vaporized material. For at least one disclosed embodiment, the structure may help support material for vaporization in the same form as when the material is placed at the structure. For at least one disclosed embodiment, the structure may help support material with an increased exposed surface area relative to a maximum exposed surface area the material could have at rest in the container absent the structure. For at least one disclosed embodiment, the structure may define one or more material support surfaces in an interior region of the container in addition to a bottom surface of the interior region of the container. For at least one disclosed embodiment, the structure may define in an interior region of the container one or more material support surfaces having a total surface area greater than a surface area of a bottom surface of the interior region of the container. For at least one disclosed embodiment, gas resulting from contact of received gas with vaporized material may be delivered to atomic layer deposition (ALD) process equipment.
REFERENCES:
patent: 2721064 (1955-10-01), Reichardt
patent: 2769624 (1956-11-01), Burnside
patent: 3834682 (1974-09-01), McPhee
patent: 4190965 (1980-03-01), Erickson
patent: 4916828 (1990-04-01), Yamane et al.
patent: 5078976 (1992-01-01), Shibauchi et al.
patent: 5476547 (1995-12-01), Mikoshiba et al.
patent: 5904771 (1999-05-01), Tasaki et al.
patent: 5917140 (1999-06-01), Tom
patent: 6107634 (2000-08-01), Horsky et al.
patent: 6270839 (2001-08-01), Onoe et al.
patent: 6288403 (2001-09-01), Horsky et al.
patent: 6581915 (2003-06-01), Bartsch et al.
patent: 6607785 (2003-08-01), Timmons et al.
patent: 6718126 (2004-04-01), Lei
patent: 6887337 (2005-05-01), Lebouitz et al.
patent: 2002/0192370 (2002-12-01), Metzner et al.
patent: 2003/0121608 (2003-07-01), Chen et al.
patent: 2004/0016404 (2004-01-01), Gregg
patent: 2006/0024439 (2006-02-01), Tuominen et al.
patent: 1 508 631 (2005-02-01), None
patent: 58-126973 (1983-07-01), None
patent: 60-70176 (1985-04-01), None
patent: 4333572 (1992-11-01), None
Banton Jeffrey I.
Battle Scott L.
Gregg John N.
Laxman Ravi
Naito Donn K.
Advanced Technology & Materials Inc.
Bushey Scott
Chappuis Maggie
Gustafson Vincent K.
Intellectual Property / Technology Law
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