Method and apparatus to easily measure reticle blind...

Details Method and apparatus to easily measure reticle blind... Method and apparatus to easily measure reticle blind...

2006-02-28

2006-02-28

Duda, Kathleen (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S322000

Reexamination Certificate

active

07005221

ABSTRACT:
A method, exposure apparatus, and printed wafer such that a design is printed within a peripheral portion of the wafer. The peripheral portion of the wafer is between an outer boundary of an active portion of the wafer and an outer boundary of the wafer. The exposure apparatus comprises a lens, a reticle that includes a pattern, and a reticle blind. The reticle blind blocks a first portion of light that is passed through the exposure apparatus. A transparent portion of the reticle transmits a remaining portion of the light. The lens focuses the remaining portion of the light onto the wafer such that an image of a portion of the pattern is printed as the design within the peripheral portion of the wafer. The printed design is a function of where the reticle blind is positioned relative to the pattern.

REFERENCES:
patent: 4385838 (1983-05-01), Nakazawa et al.
patent: 4937618 (1990-06-01), Ayata et al.
patent: 4958160 (1990-09-01), Ito et al.
patent: 5133603 (1992-07-01), Suzuki et al.
patent: 5376482 (1994-12-01), Hwang et al.
patent: 5811211 (1998-09-01), Tanaka et al.
patent: 5830610 (1998-11-01), Leroux et al.
patent: 6151122 (2000-11-01), Taniguchi et al.
patent: 6169602 (2001-01-01), Taniguchi et al.

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