Liquid purification or separation – Processes – Ion exchange or selective sorption
Reexamination Certificate
2005-04-12
2005-04-12
Barry, Chester T. (Department: 1724)
Liquid purification or separation
Processes
Ion exchange or selective sorption
C210S758000, C210S754000, C210S760000, C210S673000, C210S677000, C210S903000, C210S692000, C210S694000, C210S748080
Reexamination Certificate
active
06878284
ABSTRACT:
A method of treating water containing a nitrogen compound, and an apparatus of treating water containing a nitrogen compound at high speed without using a biologically unstable treatment causing eutrophication in lakes and swamps. The waste water is introduced into an adsorbing tank that is filled with a zeolite, only nitrogen components are adsorbed by the zeolite, a solution containing hypochlorous acid or hypobromous acid is introduced into the adsorbing tank, and the nitrogen adsorbed in the zeolite is decomposed by the hypochlorous acid or the hypobromous acid.
REFERENCES:
patent: 50-72443 (1975-06-01), None
patent: 54-31084 (1979-03-01), None
patent: 3-181390 (1991-08-01), None
patent: 4-367784 (1992-12-01), None
patent: 5-68880 (1993-03-01), None
patent: 6-335688 (1994-12-01), None
patent: 10-43745 (1998-02-01), None
Hiro, N. et al.; “The Highly-Technology of . . . without Organic Compounds”,Japanese Lectures of 4thSymposium on Japan Society on Water Environment, pp. 125-126 (Sep. 10, 2001).
Hasegawa Yoshitaka
Hirotsuji Junji
Kamiya Toshiyuki
Messaoudi Brahim
Barry Chester T.
Leydig , Voit & Mayer, Ltd.
Mitsubishi Denki & Kabushiki Kaisha
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