Method and apparatus of pattern recognition

Details Method and apparatus of pattern recognition Method and apparatus of pattern recognition

1994-05-03

1996-10-22

Mancuso, Joseph

Image analysis

Applications

Manufacturing or product inspection

348129, 382149, G06K 909

Patent

active

055685633

ABSTRACT:
A pattern recognition apparatus and method in which a set is produced which includes a fundamental pattern vector on a basis place and other fundamental pattern vectors of the patterns displaced from the fundamental pattern on the basis place. Then a subspace spanned by fundamental pattern vectors included in the set is generated. A test pattern vector of a wafer to be inspected is projected to the subspace and similarity between the fundamental vectors and the test pattern vector is measured. Further, an image is used after it is filtered by a normalization filter. Furthermore, sensitivity of pattern recognition is varied by changing the dimension of the pattern vectors. Moreover, for objects expressed by numerical values which can not be compared directly, the data of the objects are transformed into images and, then, a set of fundamental pattern vectors are worked out.

REFERENCES:
patent: 4669123 (1987-05-01), Kobayashi et al.
patent: 5163101 (1992-11-01), Deering
"An Algorithm for Finding Newest Neighbors in Constart Average Time with a linear Space Complexity" Luisa Mico, Jose Oncina and Ennque Vidal IEEE Compert. SOC, Press 1992.

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