Method and apparatus of measuring pattern dimension and...

Details Method and apparatus of measuring pattern dimension and... Method and apparatus of measuring pattern dimension and...

2007-01-25

2008-12-02

Le, Que T (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

With circuit for evaluating a web, strand, strip, or sheet

C250S208100

Reexamination Certificate

active

07459712

ABSTRACT:
A method of measuring pattern dimensions includes evaluating a relationship between cross-sectional shapes of a pattern and measurement errors of a pattern in a specified image processing technique, and conducting an actual measurement in which dimension measurement of an evaluation objective pattern from image signals of a microscope is carried out, and revising errors of the dimension measurement of the evaluation objective pattern based on the relationship between the cross-sectional shapes of a pattern and the measurement errors of a pattern previously evaluated.

REFERENCES:
patent: 4030830 (1977-06-01), Holly
patent: 4938599 (1990-07-01), Goszyk
Villarubia, J.S., et al “Scanning Electron Microscope Analog of Scatterometry,” Proceedings of SPIE vol. 4689 (2002) pp. 304-312, USA.
Villarubia, J.S. et al “A Simulation Study Of Repeatability And Bias In The CD-SEM,” Proceedings of SPIE vol. 5038 (2003), pp. 138-149, USA.

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