Method and apparatus of measuring carrier distribution

Radiant energy – Invisible radiant energy responsive electric signalling – Infrared responsive

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

250341, G01N 2121

Patent

active

044726333

ABSTRACT:
A semiconductor wafer is irradiated with a linearly polarized infrared light beam. On the basis of changes in the polarized state of the light reflected from the wafer, the distribution of the density of carriers depthwise in the wafer is determined. Distribution of the carrier density in the semiconductor wafer can be measured very rapidly in a contactless manner without destroying the wafer.

REFERENCES:
patent: 3426201 (1969-02-01), Hilton et al.
patent: 3623818 (1971-11-01), Gardner et al.
patent: 4030836 (1977-06-01), Smith

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus of measuring carrier distribution does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus of measuring carrier distribution, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus of measuring carrier distribution will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-795475

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.