Photography – Fluid-treating apparatus – Fluid application to one side only of photographic medium
Patent
1997-11-06
1999-11-16
Rutledge, D.
Photography
Fluid-treating apparatus
Fluid application to one side only of photographic medium
396606, 396620, 118100, G03D 500
Patent
active
059845392
ABSTRACT:
The present invention relates to a method and apparatus of applying a solution of a predetermined viscosity to photosensitive material to form a protective coating on the photosensitive material. The method and apparatus can be used in a photographic processing device, and the apparatus can be built into an existing or new photographic processor or added on as an accessory. The method and apparatus is utilized to apply a viscous solution to at least one surface of processed photosensitize materials prior to drying in a manner that allows the solution to be uniformly applied to the at least one surface at a specific layer thickness. The viscous solution after drying functions as a protective coating which can protect the processed photosensitize material against scratches and moisture. The apparatus includes a control mechanism which controls the thickness, uniformity and laydown amount of the applied viscous solution so as to insure that a uniform coating that provides protection to the entire surface of the processed photosensitize material is provided.
REFERENCES:
patent: 2173480 (1939-09-01), Jung
patent: 2751315 (1956-06-01), Staehle
patent: 3083120 (1963-03-01), Paterson
patent: 3453138 (1969-07-01), Chen et al.
patent: 4456637 (1984-06-01), Takeda et al.
patent: 4464035 (1984-08-01), Schoering
patent: 4623236 (1986-11-01), Stella
patent: 4737810 (1988-04-01), Kobayashi et al.
patent: 5228920 (1993-07-01), Thompson, III
patent: 5309192 (1994-05-01), Lu
patent: 5354379 (1994-10-01), Milbourn et al.
patent: 5481328 (1996-01-01), Verhoest et al.
patent: 5792260 (1998-08-01), Rantanen et al.
Patent Abstracts of Japan, vol. 11, No. 283 (p-615), Sep. 12, 1987 & JP 62 079453A (Onda Shoji K.K.), Apr. 11, 1987.
Patent Abstracts of Japan, vol. 13, No. 358 (p-916), Aug. 1989 & JP 01 118133A (Brother Independent., Ltd.).
Bohan Anne E.
Breese Gordon F.
Hanumanthu Ramasubramaniam
O'Connor Kevin M.
Patton David L.
Eastman Kodak Company
Novais David A.
Pincelli Frank
Rutledge D.
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