Metal treatment – Compositions – Heat treating
Patent
1974-11-15
1976-04-13
Rutledge, L. Dewayne
Metal treatment
Compositions
Heat treating
357 91, H01L 21263
Patent
active
039501876
ABSTRACT:
A pulsed electron beam generator produces a short duration pulse of electrons in the form of a directed beam for thermal processing of a semiconductor device, which is positioned in a pulsed electron beam chamber so that the propagating electron beam impacts upon the device surface in selected regions of the device that are to be processed. Energy deposited by the impacting electron pulse momentarily elevates the temperature of the selected regions above threshold processing temperatures for rapid, effective annealing, sintering or other thermal processing. The characteristics of the electron beam pulse are such that only those surface vicinity regions to be processed are elevated to a high temperature, the remaining mass of the semiconductor device not being subjected to unnecessary or undesirable high temperature exposure.
REFERENCES:
patent: 3272661 (1966-09-01), Tomono et al.
patent: 3347701 (1967-10-01), Yamagishi et al.
patent: 3532910 (1970-10-01), Lee et al.
patent: 3533857 (1970-10-01), Mayer et al.
patent: 3737346 (1973-06-01), Godfrey
patent: 3796929 (1974-03-01), Nicholas et al.
Davis J. M.
Rutledge L. Dewayne
Simulation Physics, Inc.
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