Method and apparatus for X-ray reflectance measurement

X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C378S081000, C378S084000, C378S089000

Reexamination Certificate

active

11178773

ABSTRACT:
In a method for X-ray reflectance measurement in which an intensity of a reflected X-ray is observed for each incident angle, a measuring scale for the incident angle ω is corrected, before the reflectance measurement, using an analyzer crystal. In the corrective operation, the aperture width of the receiving slit is made wider than in the X-ray reflectance measurement, and the analyzer crystal is inserted in the reflection path, and then the reflected X-ray intensity is detected. In this condition, the incident angle ω of the incident X-ray to the sample surface can be determined accurately, and thus the measuring scale for the incident angle can be corrected. Thereafter, the analyzer crystal is removed from the reflection path, and the X-ray reflectance measurement for the sample surface is carried out.

REFERENCES:
patent: 6577705 (2003-06-01), Chang et al.
patent: 2004/0190681 (2004-09-01), Omote
patent: 1 462 795 (2004-09-01), None
patent: 11-258185 (1999-09-01), None
patent: 2000-035408 (2000-02-01), None
patent: 3109789 (2000-09-01), None
patent: 3468623 (2003-09-01), None
patent: 3504539 (2003-12-01), None
patent: 2004-093521 (2004-03-01), None
K. Omote & K. Inaba. “Thin Film Evaluation Method Using Glazing Incidence X-ray Diffraction”, Analysis, Japan Society for Analytical Chemistry, 2002, vol. 11, pp. 623-629.
C. Zakri et al. “Determination of the In-Plane Elastic Tensor of Crystalline Decanol Monolayers on Water by X-ray Diffraction”, The American Physical Society, 1997, Physical Review B, vol. 55, No. 21, Jun. 1, 1997—entire document.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for X-ray reflectance measurement does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for X-ray reflectance measurement, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for X-ray reflectance measurement will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3858967

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.