Method and apparatus for writing oxide film

Details Method and apparatus for writing oxide film Method and apparatus for writing oxide film

1989-03-22

1991-05-14

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118722, 118501, C23C 1648

Patent

active

050146467

ABSTRACT:
A substrate is exposed to a gas of reactive material and an oxidizing gas. The oxidizing gas includes an ozone gas. A laser light beam is applied to the substrate through the reactive material gas and the oxidizing gas. The laser light beam activates the oxidizing gas. The activated oxidizing gas reacts with the reactive material gas to form an oxide deposited on the substrate.

REFERENCES:
patent: 4711790 (1987-12-01), Morishige
"Low-Temperature Growth of Transparent and Condacting Tin Oxide Film by Photochemical Vapor Deposition" by T. Tabuchi et al.; Japanese Journal of Applied Physics, vol. 26, No. 3, Mar. 1987, pp. L186-L189.

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