Method and apparatus for writing or etching narrow linewidth pat

Details Method and apparatus for writing or etching narrow linewidth pat Method and apparatus for writing or etching narrow linewidth pat

1990-10-09

1991-09-10

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250306, 250307, 2504923, H01J 37317

Patent

active

050476491

ABSTRACT:
A method and apparatus for producing fine line patterns on insulating surfaces utilizing a conductive spring-like cantilever having a pointed tip which is in proximity to the surface to be affected. Electrons emitted from the tip travel toward the insulator surface and cause changes therein or affect molecules located in the proximity of the insulator surface. Tunneling current is not required, and a highly conducting return current path for electrons through the insulator is not necessary. The incident electrons can be used to provide patterned, narrow-width features either by deposition of a material onto the insulator surface, or by producing etching in localized regions of the insulator surface, or by changing the insulator surface so that it can be etched.

REFERENCES:
patent: 4316093 (1982-02-01), Broers et al.
patent: 4343993 (1982-08-01), Binnig et al.
patent: 4422002 (1983-12-01), Binnig et al.
patent: 4550257 (1985-10-01), Binnig et al.
patent: 4668865 (1987-05-01), Gimzewski et al.
patent: 4724318 (1988-02-01), Binnig
patent: 4785189 (1988-11-01), Wells
patent: 4823004 (1984-04-01), Kaiser
patent: 4907195 (1990-03-01), Kazan et al.
"Fast Scan Piezo Drive", IBM Technical Disclosure Bulletin, vol. 27, #10B, Mar. 1985, p. 5976, G. K. Binnig et al.
"Sound and Vibration Insulation for Sensitive Apparatus", IBM Technical Disclosure Bulletin, vol. 27, #5, p. 3137, G. K. Binnig et al., Oct. 1984.

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