Method and apparatus for wet-cleaning substrate

Details Method and apparatus for wet-cleaning substrate Method and apparatus for wet-cleaning substrate

2005-09-06

2005-09-06

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

Automatic controls

C134S103200, C134S184000, C134S186000, C436S039000, C436S055000, C073S073000, C073S075000, C236S04400R, C236S049100

Reexamination Certificate

active

06938626

ABSTRACT:
An apparatus for wet cleaning a substrate includes a clean air supplier for supplying the clean air into a cleaning draft, a humidifier for supplying steam or mist like water drops into the cleaning draft, a hygrometer, connected to the humidifier and positioned at the level of the cleaning solution, an exhaust piping and an exhaust rate control means.

REFERENCES:
patent: 5472516 (1995-12-01), Hanson et al.
patent: 5976988 (1999-11-01), Konuma et al.
patent: 6092539 (2000-07-01), Chang et al.
patent: 6261845 (2001-07-01), Verhaverbeke et al.
patent: 198 40 989 (1999-03-01), None
patent: 56000214 (1981-01-01), None
patent: 63-151028 (1988-06-01), None
patent: 8-334461 (1996-12-01), None
patent: 9022891 (1997-01-01), None
patent: 98/56726 (1998-12-01), None
patent: 01/39262 (2001-05-01), None
Kashkoush et al: In-Situ Chemical Concentration Control for Wafer Wet Cleaning, Journal of the IEST, Mont Prospect, IL, US vol. 41, No. 3 May 1998, pp. 24-30 XP000957413.

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