Method and apparatus for wavevector selective pyrometry in rapid

Thermal measuring and testing – Temperature measurement – In spaced noncontact relationship to specimen

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374126, G01J 508

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056285647

ABSTRACT:
A method and apparatus for optical pyrometry in a Rapid Thermal Processing (RTP) System, whereby the radiation used to heat the object to be processed in the RTP system is in part specularly reflected from specularly reflecting surfaces and is incident on the object with a particular angular distribution, and the thermal radiation from the object is measured at an angles different from the angle where the incident radiation specularly reflected from the surface of the object is a maximum.

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K. L. Knutson et al., Modeling of 3-dimensional effects on temperature uniformity in RTP of 8" wafers., IEEE Trans. On Semiconductor Manufacturing 7, 68, (1994).

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