Wells – Above ground apparatus – With means for inserting fluid into well
Patent
1985-02-28
1986-04-08
Suchfield, George A.
Wells
Above ground apparatus
With means for inserting fluid into well
166 97, 166302, 166308, E21B 3303, E21B 33047
Patent
active
045806292
ABSTRACT:
The invention is directed to the stimulation of water flow into a substantially dry well shaft from adjacent rock and soil strata bearing water supplies by developing passages from such water supplies through the well walls. Liquid or gaseous nitrogen and liquid or gaseous carbon dioxide are introduced into the well either individually or in combination and alternately pressurized and depressurized to cause the rock structure between said well wall and said water supplies to be exposed to high pressures and fractured to thereby open a passage from said water supplies to said well. A well cap is provided to seal the well and retain the pressure developed therein while providing for the introduction of the required materials. Means are also provided to release the pressure in the well quickly to return same to its unpressurized condition.
REFERENCES:
patent: 1431779 (1922-10-01), Conrader
patent: 1857101 (1932-05-01), Nixon
patent: 2245870 (1941-06-01), Norman
patent: 2689611 (1954-09-01), Martinson
patent: 2931379 (1960-04-01), Haydin
patent: 3095929 (1963-07-01), McGuire et al.
patent: 3108636 (1963-10-01), Peterson
patent: 3154148 (1964-10-01), Peterson
patent: 3393740 (1968-07-01), Seese et al.
patent: 4205722 (1980-06-01), Hamar
patent: 4250965 (1981-02-01), Wiseman, Jr.
Suchfield George A.
Teschner David
LandOfFree
Method and apparatus for water flow stimulation in a well does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for water flow stimulation in a well, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for water flow stimulation in a well will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2060785