Coating apparatus – Gas or vapor deposition – Having means to expose a portion of a substrate to coating...
Patent
1986-09-24
1989-01-31
Beck, Shrive
Coating apparatus
Gas or vapor deposition
Having means to expose a portion of a substrate to coating...
118720, 118715, 118504, C23C 1600
Patent
active
048008400
ABSTRACT:
Disclosed are a method and a matrix panel masking apparatus for forming very closely spaced, parallel, elongated, narrow, and electrically separate conductors on a dielectric surface. The matrix panel masking apparatus comprises a plurality of elongated taut wires, being arrangable in a configuration so that the interstices between the wires correspond to the desired matrix panel conductor pattern. The method includes: superposing the matrix panel masking apparatus of this invention on the dielectric surface, depositing conductive material through the interstices and on the dielectric so that after the masking apparatus is removed, the conductors will remain.
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L. E. Tannas Jr., "Flat Panel Displays and CRTs", 1985, pp. 263, 264, 287.
Beck Shrive
Dang Vi Duong
Hamann H. Fredrick
McFarren John C.
Rockwell International Corporation
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