Coating apparatus – Gas or vapor deposition – With treating means
Patent
1992-06-29
1995-04-04
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
21912147, 21912148, 21912152, C23C 1600
Patent
active
054033993
ABSTRACT:
An apparatus for a vapor deposition of diamond by:
REFERENCES:
patent: 3578943 (1971-05-01), Schoumaker
patent: 3630679 (1971-12-01), Angus
patent: 3953704 (1976-04-01), Bejat
patent: 4122292 (1978-10-01), Karinsky
patent: 4264642 (1981-04-01), Ferralli
patent: 4377564 (1983-03-01), Dahlberg
patent: 4650953 (1987-03-01), Eger
patent: 4678718 (1987-07-01), Wang
patent: 4725447 (1988-02-01), Pfender
patent: 4812326 (1989-03-01), Tsukazaki et al.
patent: 4851254 (1989-07-01), Yamamoto
English Abstract of JP-A-63-195267.
English Abstract of JP-A-63-210010.
English Abstract of JP-A-63-210275.
English Abstract of JP-A-1-17867.
Chemical Abstracts, vol. 103, No. 20, Nov. 1985, p. 129, Abstract No. 162686a, Columbus, Ohio; & JP-A-60 118 693 (Mitsubishi Metal Corp.) Jun. 26, 1985.
Patent Abstracts of Japan, vol. 10, No. 17 (C-324) [2074], Jan. 23, 1986; & JP-A-60 171 294 (Mitsubishi Kinzoku K.K.) Sep. 4, 1985.
Patent Abstracts of Japan, vol. 9, No. 28 (C-264) [1751], Feb. 6, 1985; & JP-A-59 174 508 (Yoshitoshi Nanba) Oct. 3, 1984.
European Search Report, The Hague, Jun. 30, 1988.
Kawarada Motonobu
Koshino Nagaaki
Kurihara Kazuaki
Sasaki Ken-ichi
Bueker Richard
Fujitsu Limited
LandOfFree
Method and apparatus for vapor deposition of diamond does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for vapor deposition of diamond, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for vapor deposition of diamond will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2378547