Method and apparatus for vacuum deposition of highly ionized med

Details Method and apparatus for vacuum deposition of highly ionized med Method and apparatus for vacuum deposition of highly ionized med

1994-05-24

1997-09-23

Kunemund, Robert

Fishing, trapping, and vermin destroying

20419232, 20419212, H01L 2120

Patent

active

056704151

ABSTRACT:
A method and apparatus for vacuum depositing a coating onto a substrate are provided. The method includes the steps of: introducing an evaporant into a magnetically defined deposition region of a vacuum process chamber, ionizing the evaporant to form a plasma; generating a "magnetic bottle" magnetic field configuration to define the deposition region and to confine the plasma to the deposition region, further increasing the percentage ionization of the plasma to form a highly ionized media; creating a static dc electric field that is generally perpendicular to the magnetic field in the deposition region and parallel to the plane of the substrate; and then moving the substrate through the highly ionized media with the plane of the substrate and its direction of motion generally parallel to the magnetic field lines. The method of the invention is particularly suited to deposition of any atomistic evaporant onto intermediate-sized substrates.

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Rossnagel et al., "Metal ion deposition from ionized mangetron sputtering discharge", J. Vac. Sci. Technol, vol. 12, pp. 449-453, 1994.

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