Coating apparatus – Gas or vapor deposition – With treating means
Patent
1998-11-23
2000-03-14
Breneman, Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118723E, 20429805, 20429816, 20429823, 251193, 251187, H05H 100
Patent
active
06035805&
ABSTRACT:
A method and apparatus for vacuum depositing a coating onto a substrate are provided. The method includes the steps of: introducing an evaporant into a magnetically defined deposition region of a vacuum process chamber, ionizing the evaporant to form a plasma; generating a "magnetic bottle" magnetic field configuration to define the deposition region and to confine the plasma to the deposition region, further increasing the percentage ionization of the plasma to form a highly ionized media; creating a static dc electric field that is generally perpendicular to the magnetic field in the deposition region and parallel to the plane of the substrate; and then moving the substrate through the highly ionized media with the plane of the substrate and its direction of motion generally parallel to the magnetic field lines. The method of the invention is particularly suited to deposition of any atomistic evaporant onto intermediate-sized substrates.
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Breneman Bruce
Depositech, Inc.
Zervigon Rudy
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