Method and apparatus for vacuum depositing thin coatings using e

Details Method and apparatus for vacuum depositing thin coatings using e Method and apparatus for vacuum depositing thin coatings using e

1978-11-15

1980-12-09

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

118 501, 219121EB, 427250, B05D 306

Patent

active

042385253

ABSTRACT:
Method and apparatus for vacuum depositing thin films on substrates which are located above 500.degree. C. by electron beam heating during the deposition. The substrates are positioned above an evaporating crucible filled with a bath of the material being evaporated which is also heated by electron beams. The electron beams are deflected at an angle of less than 80.degree. onto approximately one-half of the bath surface situated between the axis of symmetry and the end of the evaporating crucible.

REFERENCES:
patent: 3912826 (1975-10-01), Kennedy
patent: 4110893 (1978-09-01), Elam et al.

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