Active solid-state devices (e.g. – transistors – solid-state diode – Regenerative type switching device – With extended latchup current level
Reexamination Certificate
2007-02-20
2007-02-20
Owens, Douglas W. (Department: 2811)
Active solid-state devices (e.g., transistors, solid-state diode
Regenerative type switching device
With extended latchup current level
C257S528000, C257S529000, C438S132000, C438S215000
Reexamination Certificate
active
10675555
ABSTRACT:
A fusible link formed on a semiconductor substrate. The fusible link comprises a silicide layer overlying a polysilicon layer. The fusible link is programmed to an open state by passing a current therethrough that opens the polysilicon and the silicide layers.
REFERENCES:
patent: 4042950 (1977-08-01), Price
patent: 4356622 (1982-11-01), Widmann
patent: 4748491 (1988-05-01), Takagi
patent: 5386158 (1995-01-01), Wang
patent: 5536968 (1996-07-01), Crafts et al.
patent: 5854510 (1998-12-01), Sur, Jr. et al.
patent: 5882998 (1999-03-01), Sur, Jr. et al.
patent: 5949712 (1999-09-01), Rao et al.
patent: 5976943 (1999-11-01), Manley et al.
patent: 6205077 (2001-03-01), Ferrant
patent: 6243294 (2001-06-01), Rao et al.
patent: 6337507 (2002-01-01), Bohr et al.
patent: 6433404 (2002-08-01), Iyer et al.
patent: 6445606 (2002-09-01), Khoury
patent: 6507053 (2003-01-01), Bernard et al.
patent: 6511868 (2003-01-01), Wang et al.
patent: 6518823 (2003-02-01), Kawai
patent: 6525955 (2003-02-01), Smith et al.
patent: 6703263 (2004-03-01), Wang et al.
S. R. Wilson, C. J. Tracy, and J. L. Freeman, Jr., “Handbook of Multilevel Metallization for Integrated Circuits,” Noyes Publ., Westwood, N.J. (1993), pp. 44, 55.
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