Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2006-01-03
2006-01-03
Smith, Zandra V (Department: 2877)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
Reexamination Certificate
active
06982793
ABSTRACT:
An alignment target includes periodic patterns on two elements. The alignment target includes two locations, at least one of which has a designed in offset. In one embodiment, both measurement locations have a designed in offset of the same magnitude but opposite directions. For example, two separate overlay patterns that are mirror images of each other may be used. Alternatively, the magnitudes and/or directions may vary between the measurement locations. The radiation that interacts with the measurement locations is compared. The calculated difference is extremely sensitive to any alignment error. If the difference between the patterns is approximately zero, the elements are properly aligned. When an alignment error is introduced, however, calculated difference can be used to determine the error. In one embodiment, the alignment target is modeled to determine the alignment error. In another embodiment, additional overlay patterns with additional reference offsets are used to determine the alignment error.
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Heaton John D.
Li Guoguang
Lowe-Webb Roger R.
Yang Weidong
Nanometrics Incorporated
Silicom Valley Patent Group LLP
Smith Zandra V
Stock, Jr. Gordon J.
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