Method and apparatus for using a synchrotron as a source in...

Details Method and apparatus for using a synchrotron as a source in... Method and apparatus for using a synchrotron as a source in...

2011-07-05

2011-07-05

Nguyen, Hung Henry (Department: 2882)

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C355S053000

Reexamination Certificate

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07973909

ABSTRACT:
One embodiment of the present invention provides a method to facilitate using a synchrotron as a source in an extreme ultraviolet lithography (EUVL) system, wherein the synchrotron's energy decreases over time. The EUVL system can includes a stepper which uses a step-and-repeat process or a step-and-scan process to transfer patterns from a reticle onto a wafer. The wafer is desired to be exposed to a substantially constant dose. During operation, the system can measure a synchrotron current, and adjust the stepper's exposure duration or the stepper's scan speed based on the synchrotron current so that the wafer is exposed to the substantially constant dose. Note that using the synchrotron current to control the stepper can enable the EUVL system to expose the wafer to the substantially constant dose without using additional equipment to monitor the source's energy.

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patent: 5606586 (1997-02-01), Amemiya
patent: 6335786 (2002-01-01), Shiraishi
patent: 6449332 (2002-09-01), Chiba
patent: 6700644 (2004-03-01), Sweatt
patent: 6850313 (2005-02-01), Ishikawa et al.

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